JPS6314369Y2 - - Google Patents
Info
- Publication number
- JPS6314369Y2 JPS6314369Y2 JP1434382U JP1434382U JPS6314369Y2 JP S6314369 Y2 JPS6314369 Y2 JP S6314369Y2 JP 1434382 U JP1434382 U JP 1434382U JP 1434382 U JP1434382 U JP 1434382U JP S6314369 Y2 JPS6314369 Y2 JP S6314369Y2
- Authority
- JP
- Japan
- Prior art keywords
- insulator
- vacuum chamber
- gas
- refrigerant
- tip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012212 insulator Substances 0.000 claims description 20
- 239000003507 refrigerant Substances 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 8
- 230000005684 electric field Effects 0.000 claims description 5
- 239000007789 gas Substances 0.000 description 27
- 150000002500 ions Chemical class 0.000 description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Tubes For Measurement (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1434382U JPS58117053U (ja) | 1982-02-04 | 1982-02-04 | 電界電離型イオン源 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1434382U JPS58117053U (ja) | 1982-02-04 | 1982-02-04 | 電界電離型イオン源 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58117053U JPS58117053U (ja) | 1983-08-10 |
| JPS6314369Y2 true JPS6314369Y2 (en]) | 1988-04-22 |
Family
ID=30026813
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1434382U Granted JPS58117053U (ja) | 1982-02-04 | 1982-02-04 | 電界電離型イオン源 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58117053U (en]) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61240543A (ja) * | 1985-04-18 | 1986-10-25 | Jeol Ltd | イオン源 |
| JP5134439B2 (ja) * | 2008-05-30 | 2013-01-30 | 株式会社日立ハイテクノロジーズ | イオンビーム装置 |
-
1982
- 1982-02-04 JP JP1434382U patent/JPS58117053U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58117053U (ja) | 1983-08-10 |
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